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Engineering · Electrical Engineering
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(a) 1 H m 2 um 3 um A. semiconductor film Cross section of TLM characterization pattern for determining contact resistances (b) R34 R40 R23 R12 8 20 Distance (Rum) TLM resistances versus distance between the contacts

(1) The figures above show the TLM pattern and the dependence of the resistances between the pair of contacts on the distance between the contacts. The contact width W = 47 um.

What is the sheet resistance (resistance per square) of the film? (Unit: Ohm)

(2) What is the unit-width ohmic contact resistance per 1 mm of the contact width? (Units: Ohm*mm)

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